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Girls on Fire: March 2012

By: Laura Stoltz | Elizabeth May is a role model. In The Project, her latest book, she reminisces about her life as an activist in the anti-war movement during the 1960s and how she turned her energy to another life-changing experience – creating a grassroots, feminist movement in Canada. After practising law for a decade, May came to realize the injustices done to women and children in the world. She decided to participate in many different initiatives in order to give back to the community. In 2008, May founded Women’s Action to Aid the Employment of Women (W.A

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1. Field of the Invention
This invention relates to a processing method for forming a polycrystalline silicon film, more particularly to a processing method by plasma CVD (Chemical Vapor Deposition) and a dry etching method for forming a polycrystalline silicon film to be effective in a semiconductor device having good characteristics and a low leakage current.
2. Description of the Prior Art
As a manufacturing method for a non-single crystal silicon crystal to be used for a semiconductor device having a good electric performance, there are given a Vapor Phase Epitaxy (hereinafter may be called “VPE”) method and a liquid-phase recrystallization method. The VPE method includes: heating a silicon wafer in a chemical vapor deposition (CVD) apparatus, thereby generating a reaction gas including silicon. The liquid-phase recrystallization method includes: heating a silicon wafer in a chemical vapor deposition (CVD) apparatus, thereby generating a reaction gas including silicon, passing the reaction gas into a heat container, controlling the temperature of the reaction gas, and then heating the silicon wafer in a heat container, thereby melting and diffusing the silicon into the silicon wafer.
However, in the above-mentioned conventional manufacturing methods
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